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Spatial atomic layer deposition (SALD) is a powerful thin-film deposition technique to control surfaces and interfaces at the nanoscale. To further develop SALD technology, there is need to deepen our understanding of the effects that process parameters have on the deposited film uniformity. In this study, a 3D computational model that incorporates laminar-flow fluid mechanics and transport of diluted species is developed to provide insight into the velocity streamlines and partial-pressure distributions within the process region of a close-proximity atmospheric-pressure spatial atomic layer deposition (AP-SALD) system. The outputs of this transport model are used as the inputs to a surface reaction model that simulates the self-limiting chemical reactions. These coupled models allow for prediction of the film thickness profiles as they evolve in time, based on a relative depositor/substrate motion path. Experimental validation and model parameterization are performed using a mechatronic AP-SALD system, which enable the direct comparison of the simulated and experimentally measured geometry of deposited TiO2 films. Characteristic features in the film geometry are identified, and the model is used to reveal their physical and chemical origins. The influence of custom motion paths on the film geometry is also experimentally and computationally investigated. In the future, this digital twin will allow for the capability to rapidly simulate and predict SALD behavior, enabling a quantitative evaluation of the manufacturing trade-offs between film quality, throughput, cost, and sustainability for close-proximity AP-SALD systems. 

Spatial atomic layer deposition (SALD) is a thin film deposition technique that could provide precise atomic-scale control at a large enough scale for many applications, such as clean energy technologies, catalytic conversion, batteries, and anti-fouling coatings. The spatially separated precursor zones are sequentially exposed to the substrate surface to deposit a film with precise control. If the precursor zones were to intermix during a deposition process, the precise control over film thickness would be lost. Therefore, it is essential to control the location of the precursors within the process region during a manufacturing process. This is typically achieved by controlling the gas flow rates and/or pressures, however it is challenging to actively monitor the location of the precursors during a deposition process as the process region has a small characteristic length and the vapor/gas precursors are difficult to observe/monitor. Therefore, there is a need to validate the precursor location and consequential process quality during a deposition. This can be of particular importance for substrate surfaces that are highly irregular or for manufacturing conditions where external factors such as temperature and ambient air speeds could change dynamically. In this study, a reduced order COMSOL Multiphysics® model is introduced that can predict the location of precursors in the process region. The model itself is discussed; the mesh size is selected considering accuracy and computation time; the model outputs are shown; and an initial experimental validation of the model is demonstrated. 

Abstract A customized atmospheric‐pressure spatial atomic layer deposition (AP‐SALD) system is designed and implemented, which enables mechatronic control of key process parameters, including gap size and parallel alignment. A showerhead depositor delivers precursors to the substrate while linear actuators and capacitance probe sensors actively maintain gap size and parallel alignment through multiple‐axis tilt and closed‐loop feedback control. Digital control of geometric process variables with active monitoring is facilitated with a custom software control package and user interface. AP‐SALD of TiO₂is performed to validate self‐limiting deposition with the system. A novel multi‐axis printing methodology is introduced usingx‐yposition control to define a customized motion path, which enables an improvement in the thickness uniformity by reducing variations from 8% to 2%. In the future, this mechatronic system will enable experimental tuning of parameters that can inform multi‐physics modeling to gain a deeper understanding of AP‐SALD process tolerances, enabling new pathways for non‐traditional SALD processing that can push the technology towards large‐scale manufacturing. 

Abstract The capabilities of manipulating and analyzing biological cells, bacteria, viruses, deoxyribonucleic acids (DNAs), and proteins at high resolution are significant in understanding biology and enabling early disease diagnosis. The progress in developments and applications of plasmonic nanotweezers and nanosensors is discussed, where the plasmon‐enhanced light‐matter interactions at the nanoscale improve the optical manipulation and analysis of biological objects. Selected examples are presented to illustrate their design and working principles. In the context of plasmofluidics, which merges plasmonics and fluidics, the integration of plasmonic nanotweezers and nanosensors with microfluidic systems for point‐of‐care (POC) applications is envisioned. Perspectives on the challenges and opportunities in further developing and applying the plasmofluidic POC devices are provided.